English
The Silicon Susceptor is utilized in semiconductor CVD and PVD machines to provide support for wafers during high-temperature processes, ensuring stability and preventing any potential damage caused by nitrogen flow or accidental dropping. Compared to SiC Susceptor, Silicon Susceptor has the same material as the wafer, the same coefficient of thermal expansion, and a shorter delivery time
Additionally, Silicon Susceptor can also be utilized as a wafer carrier in semiconductor etching equipment.
The minimum thickness reaches 1mm; High purity; Recyclable and reusable.
Self-developed cleaning technology, the surface metal ion residue meets the requirements of silicon wafer treatment process.
Mature processing process.
The Silicon Susceptor is utilized for transporting the wafer.
