English
The Silicon Electrode is utilized in dry etching equipment for the manufacturing of semiconductor integrated circuits. The silicon electrode serves as both the pathway for etching gas to enter the cavity and as an electrode to generate plasma, making it a crucial component in the wafer manufacturing etching process.
High-precision no-damage customized showerhead.
High purity of mono-crystalline silicon materials.
High precision of products.
High control on the metal contamination.
Curved surface.
| Diameter | Within 650mm |
| Aperture | 0.2mm-2.0mm |
| Thickness | Within 200mm |
| Conductive Type/Doping | Custom |
| Resistivity | Low Resistance (E.G.<0.015,<0.02...). ; |
| Moderate Resistance (E.G.1-4); | |
| High Resistance (E.G. 60-90); | |
| Customer Customization | |
| Material Type | Polycrystal/Single Crystal |
| Crystal Orientation | Customized |
The Silicon Electrode is used in the dry etching machine as the upper electrode.
